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  • Aluminium sputtering target
  • Aluminium sputtering target
  • Aluminium sputtering target
  • Aluminium sputtering target
Aluminium sputtering target Aluminium sputtering target Aluminium sputtering target Aluminium sputtering target

Aluminium sputtering target

  • Product Item:BH-03
  • Purity: 99.9-99.99% available
  • ASTM B391-2018
  • Customization supported
  • Aluminium series sputtering targets and cathode in accordance with ASTM, including various pure Aluminium and Aluminium alloys targets
  • Aluminium sputtering target  , sputtering target  , aluminium
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    Description

    Technical Parameters

    Material categories

    Aluminium sputtering target

    Molecular formula

    Al

    CAS No

    7429-90-5

    Purity

    99.9%-99.999%

    Molar mass

    26.981

    Density

    2.7g/cm³

    Melting point

    660.32 °C

    Boiling point

    2519 °C

    Solubility (water)


    Product Overview:
    Pure aluminum is soft, loses tensile strength at about 300°C, and has a melting point of 660.4°C. The treated aluminum alloy is tough and easy to stretch. It has a metallic luster, and the surface is silvery and shiny when smooth, and dark gray when rough. Non-magnetic and not easy to ignite. The ability to reflect visible light is strong (about 92%), and the reflection of far infrared can reach 98%. In most applications, various aluminum alloys are used because of their higher strength and hardness. The yield of pure aluminum is 7 ~ 11MPa, while aluminum alloy can reach 200 ~ 600MPa. Aluminum is malleable, with a elongation of 50-70%, and is easy to draw and extrude. It is also easily machined and cast.


    Product Application:
    3N8-4N8 aluminum is mostly used for rolled electrolytic capacitor aluminum foil, lighting fixtures and data storage. 5N-6N ultra-pure aluminum is mostly used in the manufacture of semiconductor devices, the manufacture of optoelectronic storage media, superconducting cable stabilization materials, and space shuttle scientific research plays an important role.



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    Product Categories

    • Sputtering Target
      • Element Sputtering Targets
      • Alloy Sputtering Targets
      • Ceramic Target
    • Rare Earth Materials
      • Elemental Rare Earth Metals
      • Rare Earth Alloy Material
      • Rare Earth Oxide
      • Other Rare Earth Compounds
    • Evaporation Materials
      • Fluoride
      • Nitride
      • Oxide
      • Metal
      • Sulfides and Selenides
      • Carbide
      • Other Compounds
    • Metal powder
    • Battery Material
      • Solid State Battery Material
      • Additive
      • Hydrogen Storage Material
      • Oxygen Storage Material
    • Chemical Reagent
    • Production Parts
    • Customized Consultation

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