Description
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Technical Parameters |
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Material categories |
Hafnium sputtering target |
Molecular formula |
Hf |
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CAS No |
7440-58-6 |
Purity |
99.9-99.999% |
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Molar mass |
178.49 |
Density |
13.09g/mL |
|
Melting point |
2230℃ |
Boiling point |
3090℃ |
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Solubility (water) |
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Product Overview:
Hafnium can be used as a control material for reactors. The higher the purity of hafnium metal, the higher the laser damage threshold of the prepared hafnium oxide film. HfO2 film, has the following effects: reduce the optical absorption of hafnium oxide film; the average refractive index of the film was reduced;the optical inhomogeneity of the film is reduced and the scattering loss is low.
Product Application:
It is mainly used to make control rods for atomic reactors, and is also used as an antigassing agent and an additive for cemented carbide.
