Description
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Technical Parameters |
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Material categories |
Tantalum sputtering target |
Molecular formula |
Ta |
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CAS No |
7440-25-7 |
Purity |
99.9-99.99% |
|
Molar mass |
180.948 |
Density |
16.6 g/cm3 |
|
Melting point |
2996 ℃ |
Boiling point |
5425 ℃ |
|
Solubility (water) |
Soluble in hydrofluoric acid. It is strongly dissolved in nitric acid and hydrofluoric acid. |
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Product Overview:
Tantalum is malleable and can be drawn into thin filaments to make thin foils. Its coefficient of thermal expansion is very small. It expands by only 6.6 parts per million per degree Celsius. In addition, its toughness is very strong, even better than copper.
Product Application:
High purity tantalum can be used as a solid electrolytic capacitor with large capacity, small size and stable performance, used in radar, missiles, supersonic aircraft and electronic computers, tantalum can also manufacture petrochemical heat exchangers, heaters, concentrators and reactors, tanks, towers, pipelines and valves. Tantalum can also be used as electronic transmitting tube and high-power tube parts material, tantalum alloy can be used as supersonic aircraft combustion chamber and heat-resistant high-strength material, tantalum tungsten alloy missile nozzle.
